SONIQ
Megasonic System

Ultimate Cleanliness

Precision Cleaning, Made in Germany

 

Why SONIQ?

SONIQ blends high-frequency acoustic innovation with German engineering. Fully assembled in Germany, our system delivers unmatched uniformity in wafer cleaning while minimizing particle contamination and ensuring structural integrity – for use across high-precision applications.

  • Flawless cleaning from center to edge

  • Designed for the most demanding substrates

  • Built for durability and long-term reliability

SONIQ’s refined technology is deeply versatile. Whether you’re in semiconductors, optics, MEMS, or solar manufacturing, our system removes sub-micron particles easily and gently using high-frequency acoustic energy – without the need for harsh chemicals or aggressive cycles.

  • Semiconductor cleaning (front-end, post-CMP, photoresist removal)

  • Precision optics cleaning

  • MEMS and microstructure processing

  • Solar wafer particle removal

The SONIQ Advantage

expertise

Precision Cleaning

Delivers uniform megasonic energy from wafer center to edge, ensuring consistent removal of sub-micron particles without damaging delicate structures.

German Engineering

Designed, assembled, and quality-checked in Germany for exceptional reliability, long service life, and superior performance.

Versatile Applications

Ideal for semiconductor, MEMS, optics, and solar industries - adaptable to various chemistries and process environments.

Efficiency & Yield

Optimized for reduced process times, lower operating costs, and improved product yield through superior contamination control.

Performance You Can Measure

it works

SONIQ delivers measurable improvements in every key performance metric - ensuring your process stays ahead of the competition.
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Particle Removal Efficiency (PRE)

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Cycle Time Reduction - FASTER

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Continuous Operation

Explore SONIQ’s Capabilities

know how

Delve into the features that set SONIQ apart—and discover how it can fit seamlessly into your process.

The SONIQ Megasonic System redefines precision cleaning. Whether you’re focused on removing sub-micron contaminants, accelerating cycle times, or ensuring system reliability, SONIQ brings German-engineered performance to your production floor. Explore its core advantages designed to enhance yield, efficiency, and uptime.

  • Consistent Acoustic Coverage
    Engineered to deliver uniform megasonic energy across the wafer surface – from center to edge – ensuring reliable results every time.

  • Chemical Resilience & Adaptability
    Built to endure a wide range of process chemistries, SONIQ offers flexible integration into diverse cleaning workflows.

  • Modular and Maintainable
    With a service-first design, parts are easy to access and upgrade – minimizing downtime and maximizing longevity.

  • Reliable, German-Assembled Quality
    Each unit is assembled and tested in Germany, giving you peace of mind with precision build quality and dependable performance.

From the first concept to the final test, SONIQ was built with one goal: to optimize your cleaning process. Leveraging advanced megasonic technology and robust German assembly, it delivers consistent, measurable improvements in throughput, yield, and cost efficiency – no matter your application.

  • High Particle Removal Efficiency
    Removes even the smallest contaminants while protecting fragile structures and surface features.

  • Energy-Efficient Operation
    Optimized acoustic power delivery reduces energy use while maintaining exceptional cleaning performance.

  • Flexible Integration
    Designed to fit seamlessly into both new and existing cleaning tools, with minimal installation effort.

  • Proven Reliability in Production
    Trusted by manufacturers for continuous operation in demanding, high-volume environments.

Ready to take your cleaning to the next level?

start now